[21p-C206-1~13] 7.1 X線技術

▼ [21p-C206-6] A high-transmittance Schwarzschild objective (SO) to focus high-intensity EUV-VUV light from laser-plasma light source

〇(M2)Yubo Wang¹、Tanaka Nozomi¹、Katsunobu Nishihara¹、Shinsuke Fujioka¹、Atsushi Sunahara^1,2、Tomoyuki Johzaki^1,3、Kyung Sik Kang⁴、Youngduk Suh⁴、Jeong-Gil Kim⁴、Shinji Ueyama⁵、Ken Ozawa⁵ (1.ILE Osaka Univ.、2.Purdue University、3.Hiroshima University、4.Samsung MR、5.Samsung R&D Institute Japan)

キーワード：EUV source, Laser Produced plasma, EUV optics

Extreme ultraviolet (EUV) and vacuum ultraviolet (VUV) technology offer a wide range of benefits and have a large number of practical applications, such as EUV-VUV imaging, spectroscopy, Nano-machining and so on. laser-produced plasma (LPP) is often used as EUV-VUV light source with short-pulse (nanosecond), high-temperature (10-100 eV), and high-density (~10²¹ cm^-3) plasma. This plasma can emit light in different wavelength from ~10nm to ~180nm and its peak can be shifted by changing driver laser parameters.
The SO focusing system distinguishes itself for eliminating coma aberration as well as astigmatism with two concentric reflective mirrors. We have designed and tested a SO to mainly collect longer wavelength component from Xe plasma emission. The large primary mirror reflects and focuses light on the secondary mirror, which can reflect again to gather it on focal point. There, this intense radiation can be used for applications. Details will be discussed in the talk.