2:00 PM - 2:15 PM
[22p-A406-5] Etching characteristics of GaN in Fluorocarbon plasmas
Keywords:etching
Presentation information
Oral presentation
8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment
[22p-A406-1~15] 8.2 Plasma deposition of thin film, plasma etching and surface treatment
Thu. Sep 22, 2022 1:00 PM - 5:00 PM A406 (A406)
Toru Harigai(Toyohashi Univ. of Tech.), Takayoshi Tsutsumi(名大)