[22p-A406-1~15] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[22p-A406-9] Low-temperature Formation of High-Performance IGZO Thin Film Transistors using Reactive Plasma Processes

〇Kosuke Takenaka¹, Yuji Hayashi¹, Susumu Toko¹, Akinori Ebe², Yuichi Setsuhara¹ (1.Osaka Univ., 2.EMD Corp.)

Keywords:IGZO, Sputtering