[23a-B101-1~10] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[23a-B101-1] Relation between flip-flop characteristics of PTFE sputtered film and OH group

〇Kohshi Taguchi¹, Mina Tomikawa¹, Ko Minoura¹, Motohiro Yamahara¹, Kazuyuki Noborio¹ (1.SAKIGAKE-Semiconductor Co., Ltd.)

Keywords:Sputter, Flip-flop, Fourier Transform Infrared Spectroscopy

We will observe the effects of the physical properties of OH groups on the physical properties and formation of flip-flop thin films, and aim to control the conditions under which the contact angle is closer to that of the target PTFE when water is repelled. In the sputter film formation, an OH group was added to generate a thin film that stably flip-flops. By adding OH groups, it is possible to (1) control the contact angle during water repellency and (2) affect the physical properties of the flip-flop thin film. Details of changes in the physical properties of flip-flop thin films and examination of film formation conditions will be discussed in the presentation.