[23a-B101-1~10] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

△ [23a-B101-5] TiN Film Formed by DC-Filtered Arc Deposition with Anode Acting as Droplet Filter

〇jumpei kito¹, yuki hashimoto¹, yoshinori saiki¹, takahiro bando¹, toru harigai¹, hirohumi takikawa¹, hiroki gima² (1.Toyohashi Univ. Technol., 2.OSG Coating Service)

Keywords:filtered arc deposition, titanium nitride films, vacuum arc deposition

In this study, we developed a bent filtered arc deposition system that uses a bent coil as an anode and generates a filter magnetic field by DC arc current itself. For comparison, a linear filtered arc deposition system with a cylindrical anode was used. Titanium nitride films were produced using both systems. The plasma beams of both systems were observed and the number of droplets on the surface of the thin films were compared. The experimental results showed that this apparatus can generate a magnetic field by the arc current itself, transport the plasma beam, and filter droplets significantly.