[1Bp01-04] Plasma Science and Technology (PST)

[1Bp03] Fabrication of zirconium oxide films by reactive HiPIMS combined with multi pulse magnetron sputtering

*Shunsuke Ando¹, Takashi Kimura¹ (1. Graduate School of Engineering, Nagoya Institute of Technology)

A reactive high power impulse magnetron sputtering (HiPIMS) combined with reactive multi pulse magnetron sputtering (mPMS) with a low target current was proposed and applied to the fabrication of the metal oxide films. The objective is to achieve the control of the film property depending on the pulse number of mPMS. In this study, zirconium oxide thin films were synthesized via reactive HiPIMS combined with reactive mPMS at a total pressure of 0.7 Pa. The peak value of instantaneous power was 17 kW for HiPIMS and 1 kW for mPMS. The deposition rate linearly increased with the increase in the pulse number of mPMS within a limited number of pulses. In the XRD patterns for the films fabricated at various pulse number of mPMS, the weak peak at about 28°, which is attributed to (11-1) preferred orientation of ZrO₂, was observed. The observation of the weak XRD peak suggested that films were nano-crystallized.