[1Ga01-10] Thin Film (TF)

[1Ga09] Fabrication of layered-electride Ca₂N thin films using reactive magnetron sputtering

*Hiroki Kitagawa¹, Ryota Shimizu², Shigeru Kobayashi², Taro Hitosugi² (1. School of Materials and Chemical Technology, Tokyo Institute of Technology, 2. Department of Chemistry, The University of Tokyo)

Layered-electride Ca₂N has two-dimensional layered structures with alternating layers of Ca₂N⁺ and layers of electrons (e^-). Due to the high in-plane electron mobility, device applications of Ca₂N electride thin films are expected. However, so far, there has been no report of epitaxial thin-film fabrication of Ca₂N. In this study, Ca₂N thin films (thickness: ~300 nm) were deposited on yttria-stabilized zirconia (111) substrate using reactive magnetron sputtering. We optimized growth conditions as parameters of substrate temperature and nitrogen partial pressure. As a result, X-ray diffraction and Raman spectroscopy showed the fabrication of (00n)-oriented Ca₂N thin film.