[1Hp01-06] Semiconductor/Magnetic, Electronic, and Photonic devices/Electronic Material Processing (SE/TF/EMP/MI/MS)

[1Hp03] Metal pattern formation based on selective deposition using soft organofluorine materials

*Tsuyoshi Tsujioka¹ (1. Osaka Kyoiku University)

Metal pattern formation using vacuum evaporation is an essential process from basic research to industrial mass-production. Selective metal deposition using metal atom desorption from organic surface is a promising method by maskless vacuum-deposition for metal patterning. In this study, we demonstrate metal-pattern formation by maskless deposition for various metal species using a perfluoropolyether (PFPE) based material. PFPE-based film has a low dispersion component of surface free energy and surface softness, and its surface can efficiently desorb for various metal atoms. This method, which enables metal-pattern formation using maskless-vacuum-deposition for metal species with a high melting point and low intrinsic vapor pressure including Ag, Cr and Ni, can be applied to metal pattern formation for various fields.