JVSS 2023

Presentation information

Poster Presentation

[1P01-52] Poster Presentation

Tue. Oct 31, 2023 4:30 PM - 6:00 PM poster (1F)

[1P45] Low-temperature growth of vanadium dioxide thin film on c-Al2O3 substrate in reactive sputtering

*Kosuke Kasugai1, Haruki Sato1, Yuka Kurosaki1, Md Suruz Mian1, Takeo Nakano1 (1. Seikei University)

Vanadium dioxide (VO2) shows an insulator-metal transition at around 68 ℃, which can be utilized for various sensors and smart glass applications. Crystal growth of VO2 requires deposition temperatures above 400 ℃, but lower temperature is desirable. In this study, we aimed to achieve crystal growth at lower temperatures by adjusting the oxygen flow rate during the deposition of VO2 by reactive DC sputtering (r-DCMS). In the experiments, VO2 was deposited on c-Al2O3 substrates at 300-400 ℃ using r-DCMS. The oxygen flow rate was changed during deposition to alternate between metal and oxide mode of reactive sputtering. The crystallinity of the films was evaluated by XRD, and the temperature dependence of the resistance was measured. The results show that VO2 crystallizes on the c-Al2O3 substrate even at 350 ℃. The VO2 peak was confirmed by XRD and showed a resistance change of up to 1.5 orders of magnitude depending on temperature.

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