[B-3-7] Blue LED with ZnSe P-N Junction

Y. Nemoto, M. Noguchi, M. Okuda, T. Nakau (1.Department of Electronics, University of Osaka Prefecture, 2.Department of Engineering Physics, Chubu University)

1985 Conference on Solid State Devices and Materials |PDF Download

[B-3-8] Single Crystal Growth of 6H-SiC by a Vacuum Sublimation Method

Kazuyuki Koga, Toshitake Nakata, Tatsuhiko Niina (1.Research Center, Sanyo Electric Co.,Ltd.)

1985 Conference on Solid State Devices and Materials |PDF Download

[B-3-9] A Degradation Phenomenon of SiC Blue LEDs

Yasuhiko Matsushita, Yasuhiro Ueda, Toshitake Nakata, Tatsuhiko Niina (1.Sanyo Electric Co., Ltd., Research Center)

1985 Conference on Solid State Devices and Materials |PDF Download

[B-3-10] Electrical Properties of Well-Characterized BP Wafers up to High-Temperatures

Yukinobu Kumashiro, Yasumasa Okada, Shunji Misawa (1.Electrotechnicaｌ Laboratory)

1985 Conference on Solid State Devices and Materials |PDF Download

[C-2-1] Thin Oxides in VLSI

K. YAMABE (1.VLSI Research Center, TOSHTBA Corporation)

1985 Conference on Solid State Devices and Materials |PDF Download

[C-2-2] TDDB Measurements of SiO2 Gate and SiO2/Si3N4/SiO2 Gate Structure

J. Mitsuhashi, K. Sugimoto, M. Hirayama, S. Sadahiro, T. Matsukawa (1.LSI R&D Lab. Mitsubishi Electric Corporation)

1985 Conference on Solid State Devices and Materials |PDF Download

[C-2-3] Low Temperature SiO2 Film Formation by Microwaｖe Plasma Assisted Reactive Beam Deposition

Eiichi Murakami, Shin-ichiro Kimura, Terunori Warabisako, Kiyoshi Miyake, Hideo Sunami (1.Central Research Laboratory, Hitachi Ltd.)

1985 Conference on Solid State Devices and Materials |PDF Download

[C-2-4] Leakage-Current Reduction in Thin Ta2O5 Films Using High Purity Ta Target

Chisato Hashimoto Hideo Oikawa, Nakahachiro Honma (1.NTT Atsugi Electrical Communication Laboratories, 2.NTT Musashino Electrical Communication Laboratories)

1985 Conference on Solid State Devices and Materials |PDF Download

[C-2-5] Low-Temperature Nitridation of Fluorinated Oxide

Seiichi Aritome, Mizuho Morita, Masataka Hirose (1.Department of Electrical Engineering, Hiroshima University)

1985 Conference on Solid State Devices and Materials |PDF Download

[C-2-6] Optical and Electrical Properties of Amorphous Silicon Nitride Films Prepared at High Deposition Rate

Y. Nishibayashi, T. Yamamoto, T. Imura, Y. Osaka, K. Shizuma, F. Nishiyama (1.Department of Electrical Engineering, Hiroshima University)

1985 Conference on Solid State Devices and Materials |PDF Download