[19p-B4-1~21] 13.5 Si process technology

[19p-B4-1] Grain Position Control by Leading Wave Crystallization of Amorphous Silicon Films Induced by Micro-Thermal-Plasma-Jet Irradiation and Characterization of TFTs

^○Shohei Hayashi^1,2, Seiji Morisaki¹, Takahiro Kamikura¹, Shogo Yamamoto¹, Kohei Sakaike^1,2, Muneki Akazawa¹, Seiichiro Higashi¹ (Hiroshima Univ.¹, JSPS Research Fellow DC²)

Keywords:薄膜トランジスタ,アモルファスシリコン膜結晶化,熱プラズマジェット