[21a-B31-1~8] 21.1 合同セッションＫ 「ワイドギャップ酸化物半導体材料・デバイス」

[21a-B31-3] マグネトロンスパッタにより作製した酸化チタン薄膜の結晶構造及び光学・電子物性の評価

デシュムク ラフール¹、〇本田 光裕¹、安部 功二¹、後藤 敬典¹、高柳 真司^1,3、堀尾 吉巳²、市川 洋¹ (1.名工大、2.大同大、3.同志社大)

キーワード：酸化チタン光触媒、薄膜

TiO2 thin films as a photocatalyst have gained great attention due to their superior properties such as high chemical stability, nontoxicity as well as their applications in the development of environmentally harmonious, sustainable, and energy-efficient technologies. Radio frequency (rf) magnetron sputtering have been one of the preferred methods for synthesizing TiO2 thin films as it can produce a highly uniform thin film, where the relation between sputtering conditions and structural, optical and morphological properties of thin films were mostly focused. In the present study, using rf magnetron sputtering, we prepared TiO2 thin films with different thickness on a quartz substrate by changing the deposition time, and their optical, structural, and electronic properties were investigated by several characterization techniques.