The 19th International Conference on Defects-Recognition, Imaging and Physics in Semiconductors (DRIP19)

 DRIP conferences have focused on all aspects of defects in semiconductors including point and extended defects studied by a variety of detection, identification and imaging techniques. This comprehensive approach has allowed for multifaceted discussions on growth, processing and device fabrication and their interrelationships.
 The DRIP XIX conference will be held ONLINE, Aug. 29-Sep. 1 (Japan time), 2022. In the conference, most recent advances in the field of defect analysis and control will be discussed. The conference provides an outstanding international forum to present and discuss the correlation between crystal defects, material properties, and device characteristics and degradation.
 

Aug. 29 - Sep. 1 (Japan time), 2022

Conference Flyer (Download here)
 

This conference is co-organized by the DRIP XIX Executive Committee and the JSPS 145th Committee on Processing and Characterization of Crystal.
 

This conference is partially funded by Nippon Sheet Glass Foundation for Materials Science and Engineering.
 

Supported by International Collaboration Office, Meiji University