Mo-3: Nano

△ [Mo3-3] Investigation of Thermal Properties at SiO₂/Si Interface by Temperature Dependent X-ray Diffraction

*Ryo Yokogawa^1,2, Taiga Tsukushi¹, Takeshi Watanabe³, Ichiro Hirosawa^4,2, Yuichiro Yamashita⁵, Motohiro Tomita⁶, Takanobu Watanabe⁶, Atsushi Ogura^1,2 (1. Meiji Univ., 2. MREL, 3. JASRI, 4. SAGA-LS, 5. AIST, 6. Waseda Univ.)