Tu-P: Poster-1

[TuP-04] Electrical Properties of Silicon-Oxide Layers Subjected to High-Temperature Annealing under CVD Growth of Thin Carbon Films

*Oleg Soltanovich¹, Maxim Knyazev¹, Daria Sedlovets¹, Sergei Koveshnikov¹ (1. Institute of Microelectronics Technology RAS)