We-P: Poster-2

△ [WeP-02] Reduced Threading Dislocation Density in a Ge Epitaxial Film on a Submicron-Patterned Si Substrate Grown by Chemical Vapor Deposition

*MOHD FAIZ BIN AMIN¹, Takeshi Hizawa¹, Jose A. Piedra-Lorenzana¹, Tetsuya Nakai², Yasuhiko Ishikawa¹ (1. Toyohashi Univ. Tech., 2. SUMCO Corp.)