19th International Conference on Defects-Recognition, Imaging and Physics in Semiconductors

Presentation information

Print

We-P: Poster-2

General

We-P: Poster-2


✳︎Participants can view e-posters and short presentation videos anytime during Aug. 29 - Sep. 8 on the DRIP XIX website.

Wed. Aug 31, 2022 6:45 PM - 8:00 PM DRIP-Poster-ZOOM

△ [WeP-03] Electrical property investigation of the SiO2/ Si interface processed by reactive plasma deposition

*Tomohiko Hara1, Tappei Nishihara2,4, Tomoya Yamada1, Yuto Ifuji1, Yuito Yasukouchi1, Hirotaka Tamashiro1, Daiki Nakanishi2, Satoshi Yasuno3, Hyunju Lee2,1, Yoshio Ohshita1,5, Atsushi Ogura2,5 (1. Toyota Technol. Inst., 2. Meiji Univ, 3. JASRI, 4. JSPS Research Fellow, 5. Meiji Renewable Energy Laboratory Institute)