[2A508-13] EUV Lithography III

[2A509] Development of Selenonium PAGs in EUV Lithography toward High Sensitivity Achievement

*Tomohito Kizu¹, Shinji Yamakawa², Takeo Watanabe², Seiji Yasui¹, Tomoyuki Shibagaki¹ (1. San-Apro Ltd., 2. Laboratory of Advanced Science and Technology for Industry, University of Hyogo)