The 74th JSAP Autumn Meeting,2013

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13. Semiconductors A (Silicon) » 13.3 Insulator technology

[18p-P9-1~10] 13.3 Insulator technology

Wed. Sep 18, 2013 1:30 PM - 3:30 PM P9 (Davis Memorial Auditorium)

1:30 PM - 3:30 PM

[18p-P9-4] The effects of oxidation and reduction annealing on the electrical properties and phase transformation of polycrystalline HfO2 films

○Hisanori Momma1, Ryu Hasunuma1, Kikuo Yamabe1 (Univ. of Tsukuba1)

Keywords:多結晶HfO2,酸素欠損