The 74th JSAP Autumn Meeting,2013

Presentation information

Poster presentation

13. Semiconductors A (Silicon) » 13.3 Insulator technology

[18p-P9-1~10] 13.3 Insulator technology

Wed. Sep 18, 2013 1:30 PM - 3:30 PM P9 (Davis Memorial Auditorium)

1:30 PM - 3:30 PM

[18p-P9-5] Penetration of H2O and HBr molecules into SiNx films

Tomoki Oku1, Toshihiko Shiga1, Masahiro Totsuka1, Masayoshi Takemi1 (Mitsubisi Electric Corp.1)

Keywords:耐湿性,シリコン窒化膜,ダングリングボンド