[18p-P9-1~10] 13.3 Insulator technology

[18p-P9-5] Penetration of H2O and HBr molecules into SiNx films

^○Tomoki Oku¹, Toshihiko Shiga¹, Masahiro Totsuka¹, Masayoshi Takemi¹ (Mitsubisi Electric Corp.¹)

Keywords:耐湿性,シリコン窒化膜,ダングリングボンド