Evaluation of Anisotropic Biaxial Stress in Si Nano Area by Raman Spectroscopy Using Surface Plasmon Resonance

Presentation information

Oral presentation

13. Semiconductors A (Silicon) » 13.5 Si process technology

Thu. Sep 19, 2013 1:30 PM - 7:00 PM B4 (TC2 1F-106)

3:45 PM - 4:00 PM

^○Ryuhei Iwasaki¹, Kohki Nagata¹, Motohiro Tomita¹, Daisuke Kosemura¹, Atsushi Ogura¹ (Meiji Univ.¹)

Keywords:ラマン分光法,歪Si,LSPR