[20p-B4-1~8] 13.5 Si process technology

[20p-B4-4] Characterization of Thin NiSi₂ Films by Stacked Silicidation Sputtering Process with Kr Gas

^○Hiroaki Imamura¹, Taichi Inamura¹, Kuniyuki Kakushima², Yoshinori Kataoka², Akira Nishiyama², Nobuyuki Sugii², Hitoshi Wakabayashi², Kazuo Tsutsui², Kenji Natori¹, Hiroshi Iwai¹ (Tokyo Tech. FRC¹, Tokyo Tech. IGSSE²)

Keywords:積層シリサイド,Kr,シート抵抗