[28p-G2-1~16] 13.3 Insulator technology

[28p-G2-12] △Formation of Al₂O₃/GeO_x/Ge structure Using Low-Temperature and Damage-Free Neutral-Beam Oxidation Process

^○Akira Wada^1,2, Daiki Nakayama¹, Rui Zhang³, Shinichi Takagi³, Seiji Samukawa^1,4 (IFS, Tohoku Univ.¹, μSIC, Tohoku Univ.², Dept. Eng., Univ. of Tokyo³, WPI-AIMR, Tohoku Univ.⁴)

Keywords:中性粒子ビーム、酸化技術、Geプロセス技術