[29p-PB1-1~20] 13.3 Insulator technology

[29p-PB1-16] Spontaneous formation of aluminum germanate on Ge substrate by atomic layer deposition with microwave-generated atomic oxygen

Kousei Yanachi¹, Takehiro Hanada¹, Hiroki Ishizaki¹, Yohei Otani¹, Chiaya Yamamoto², Junji Yamanaka², Tetsuya Sato², Hiroshi Okamoto³, ^○Yukio Fukuda¹ (Tokyo Univ. of Science, Suwa¹, Univ. of Yamanashi², Hirosaki Univ.³)

Keywords:germanium、aluminum-germanate、interlayer