[29p-PB1-1~20] 13.3 Insulator technology

[29p-PB1-9] Oxidation annealing effect on two dimensional leakage current distribution at the same spot of polycrystalline HfO₂

^○Kyohei Shimoda¹, Ryu Hasunuma¹, Kikuo Yamabe¹, Shinji Migita² (Tsukuba Univ.¹, AIST²)

Keywords:HfO2、high-k、結晶