Oral presentation

06. Thin Films and Surfaces » 6.4 New thin-film materials

[18p-A11-1~17] 6.4 New thin-film materials

Thu. Sep 18, 2014 1:15 PM - 6:15 PM A11 (E215)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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Lunch 11:45～13:15 (11:45 AM - 1:15 PM)

1:15 PM - 1:45 PM

▲ [18p-A11-1] 「Invited lecture of overseas researcher」（30min.）
Tuning the magnetic properties of Co thin films by oxygen ion implantation

^○Jose Francisco Lopez-Barbera¹, E Menéndez², H Modarresi², M Kirby³, B.J. Kirby⁴, J Åkerman^3,5, J.A. Borchers⁴, A Vantomme², K Temst², Josep Nogués^1,6 (ICN2-Institut Catala de Nanociencia i Nanotecnologia, Spain¹, KU Leuven, Instituut voor Kern- en Stralingsfysica,Belgium², University of Gothenburg,Sweden³, National Institute of Standards and Technology,USA⁴, Royal Institute of Technology,Sweden⁵, ICREA -Institucio Catalana de Recerca i Estudis Avançat,Spain⁶)

1:45 PM - 2:00 PM

▼ [18p-A11-2] Electronic conductivity of impurity-doped Zn₃N₂ thin films

^○(D)Xiang Cao¹, Kouki Watarai¹, Yoshihiko Ninomiya¹, Atsushi Sato¹, Naoomi Yamada¹ (Chubu Univ.¹)

2:00 PM - 2:15 PM

▼ [18p-A11-3] Effect of oxidation process on MoS₂ thin film growth

^○Sinae Heo^1,2, Ryoma Hayakawa¹, Toyohiro Chikyow¹, Yutaka Wakayama^1,2 (NIMS¹, Kyusyu University²)

2:15 PM - 2:30 PM

▼ [18p-A11-4] Microfluidic control by temporally modulated thermoplasmonics

^○Kyoko Namura^1,2, Kaoru Nakajima¹, Kenji Kimura¹, Motofumi Suzuki¹ (Kyoto Univ.¹, J S P S Research Fellow²)

2:30 PM - 2:45 PM

▲ [18p-A11-5] Impact of thermal expansion of substrates on phase transition temperature of VO₂ films

^○Joe Sakai¹, Mustapha Zaghrioui¹, Masaaki Matsushima², Hiroshi Funakubo², Kunio Okimura³ (GREMAN, Univ. Tours¹, Tokyo Tech.², Tokai Univ.³)

2:45 PM - 3:00 PM

▲ [18p-A11-6] Influence of nitrogen oxide gas supply during ZnO film growth using high-temperature H₂O generated from a catalytic reaction

Yusuke Teraguchi¹, Yuuki Ohashi¹, Naoya Yamaguchi¹, Yasuhiro Tamayama¹, ^○Kanji Yasui¹ (Nagaoka Univ. Technol.¹)

3:00 PM - 3:15 PM

▲ [18p-A11-7] Preparation of a single-phase TaO₂ thin film

^○Yuji Muraoka¹, Yuki Fujimoto¹, Takanori Wakita¹, Takayoshi Yokoya¹ (Okayama Univ.¹)

Break 15:15～15:30 (3:15 PM - 3:30 PM)

3:30 PM - 3:45 PM

[18p-A11-8] Orientation control and Li-ion conduction measurement of LiH thin films

^○Hiroyuki Oguchi¹, Tamio Ikeshoji^2,3, Hiroki Kuwano¹, Susumu Shiraki³, Shin-ichi Orimo^2,3, Taro Hitosugi³ (Tohoku Univ. Engineering¹, Tohoku Univ. IMR², Tohoku Univ. AIMR³)

3:45 PM - 4:00 PM

[18p-A11-9] Crystal growth of r-oriented Cr₂O₃ thin films on YAlO₃ (001) substrate

Yutaro Hayashi¹, Takashi Sumida¹, Takumi Nakamura¹, Kosuke Hashimoto¹, Hiroshi Yamamoto¹, ^○Nobuyuki Iwata¹ (CST, Nihon Univ,¹)

4:00 PM - 4:15 PM

[18p-A11-10] Thin Film Growth of Manganese Nitride Mn₃(Cu_xAg_1-x)N

^○Takafumi Hatano¹, Toshiki Matsumoto¹, Kensuke Matsumoto¹, Koshi Takenaka², Hiroshi Ikuta¹ (Dept. Crystalline Materials Science, Nagoya Univ.¹, Dept. Appl. Phys., Nagoya Univ.²)

4:15 PM - 4:30 PM

[18p-A11-11] Structural variation of NdNiO₃ thin film by hydrogen doping

^○Tomoya Onozuka¹, Akira Chikamatsu^1,2, Tsukasa Katayama¹, Tomoteru Fukumura^1,2,3, Tetsuya Hasegawa^1,2,3 (Univ. of Tokyo¹, JST-CREST², KAST³)

4:30 PM - 4:45 PM

[18p-A11-12] Fabrication of SrVO₃ thin films on Si substrates by PLD

^○(M1)Ryo Inagaki¹, Yasushi Hotta¹, Shin-ichi Satoh¹ (Univ.of Hyogo¹)

Break 16:45～17:00 (4:45 PM - 5:00 PM)

5:00 PM - 5:15 PM

[18p-A11-13] Synthesis and resistivity of Nb-doped TiO₂ films by atmospheric chemical vapor deposition technique

^○(M2)Nozomi Kobayashi¹, Tsuyoshi Kikuta¹, Keiji Komatsu¹, Shigeo Ohshio¹, Ikumi Toda¹, Hidetoshi Saitoh¹ (Nagaoka Univ. Tech.¹)

5:15 PM - 5:30 PM

[18p-A11-14] SnO₂ thin films prepared by coplanar type surface discharge technique

^○Syota Kanezashi¹, Yuki Masuda¹, Toshimichi Hanai¹, Masato Tan¹, Masayuki Okuya¹ (Shizuoka Univ.¹)

5:30 PM - 5:45 PM

[18p-A11-15] TiO₂ thin films prepared by surface discharge technique in air

Yuki Masuda¹, Masato Tan¹, ^○Syota Kanezashi¹, Masayuki Okuya¹ (Shizuoka Univ.¹)

5:45 PM - 6:00 PM

[18p-A11-16] Tin oxide films prepared by microwave heating

Takuya Ohashi¹, Sakae Muto¹, ^○Masayuki Okuya¹ (Shizuoka Univ.¹)

6:00 PM - 6:15 PM

[18p-A11-17] Development of a patterning method for solution-process oxide-gel by UV irradiation

^○Yuuki Yoshimoto¹, Koji Nagahara¹, Tatsuya Shimoda^1,2,3 (JAIST¹, JST-ERATO², GDRC³)

Session information

[18p-A11-1~17] 6.4 New thin-film materials

▲ [18p-A11-1] 「Invited lecture of overseas researcher」（30min.）Tuning the magnetic properties of Co thin films by oxygen ion implantation

▼ [18p-A11-2] Electronic conductivity of impurity-doped Zn3N2 thin films

▼ [18p-A11-3] Effect of oxidation process on MoS2 thin film growth