[18p-A16-1~14] 13.4 Devices/Integration Technologies

[18p-A16-12] Large-scale Ultrathin Ge-on-Insulator wafer Using Epitaxial Lift-Off (ELO) Technique

^○Tatsuro Maeda¹, Eiko Mieda¹, Hiroyuki Ishii¹, Hiroyuku Hattori¹, Taro Itatani¹, Tetsuji Yasuda¹, Yuuichi Kurashima¹, Hideki Takagi¹, Takeshi Aoki², Yugami Jiro³, Taketsugu Yamamoto², Osamu Ichikawa², Takenori Osada², Tomoyuki Takada², Masahiko Hata², Arito Ogawa³, Toshiyuki Kikuchi³, Yasuo Kunii³ (AIST¹, Sumitomo Chemical², Hitachi Kokusai Electric³)

Keywords:ゲルマニウム,エピタキシャルリフトオフ