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13 Semiconductors » 13.3 Insulator technology

[20a-S221-1~12] 13.3 Insulator technology

Sun. Mar 20, 2016 9:00 AM - 12:15 PM S221 (S2)

Takeshi Ishida(HITACHI), Masato Koyama(TOSHIBA)

10:45 AM - 11:00 AM

▲ [20a-S221-7] Thermodynamic Control of GeO₂ Suppression in SiGe Oxidation by p_O2 and Temperature Manipulation

〇(D)Woojin Song¹, Akira Toriumi¹ (1.Univ. Tokyo)

Keywords:SiGe,Oxidation,Thermodynamics

　　　