The 63rd JSAP Spring Meeting, 2016

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13 Semiconductors » 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[20p-S423-1~19] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

Sun. Mar 20, 2016 1:45 PM - 6:45 PM S423 (S4)

Seiichiro Higashi(Hiroshima Univ.), Akito Hara(Tohoku Gakuin Univ.)

6:30 PM - 6:45 PM

▲ [20p-S423-19] Low Temperature Cat-Doping of Phosphorous Atoms into Crystalline Silicon through Ultrathin SiO2 Layer

〇(P)ThiCamTu Huynh1, Koichi Koyama1, Shigeki Terashima1, Hideki Matsumura1 (1.JAIST)

Keywords:Cat-doping,crystalline silicon,ultra-thin silicon dioxide