[20p-S423-1~19] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

△ [20p-S423-7] Multi-shots ELA of sputtered Si film and TFT with metal source-drain structure

〇Taisei Harada¹, Futa Gakiya¹, Takuya Ashitomi¹, Tatsuya Okada¹, Takashi Noguchi¹, Kanji Noda², Akira Suwa^2,3, Hiroshi Ikenoue³, Tetsuo Okuyama⁴ (1.Univ. of the Ryukyus, 2.GiGAPHOTON Inc., 3.Kyusyu Univ., 4.TOYOBO Co.Ltd)

Keywords:TFT,Low-temperature process,Excimer laser annealing