[20p-S423-1~19] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[20p-S423-8] Realization of p-channel TFT performance with metal source-drain using BLDA aiming for low-cost CMOS

〇Taisei Harada¹, Takuya Ashitomi¹, Tatsuya Okada¹, Takashi Noguchi¹, Nshikata Osamu², Atsushi Oota² (1.Univ. of the Ryukyus, 2.ULVAC Inc.)

Keywords:p channel poly Si TFT,Blue Multi-Laser Diode Annealing