2:00 PM - 2:15 PM
[6p-C21-2] Method for Increasing the Growth Rate of Silicon Film in SiH2Cl2-SiHx-H2 System
Keywords:epitaxial growth, dichlorosilane, growth mechanism
The growth rate increase in the SiH2Cl2-SiHx-H2 system was evaluated. The growth rate was increased with the increasing SiHx gas flow rate. Its detail will be discussed.