Susumu Ichimura

→ Search for Susumu Ichimura in Google Scholar

Speaker, Author, Co-Author

Thu. Sep 20, 2018 1:45 PM - 7:15 PM 438 (3F_Lounge)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20p-438-1~21] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

6:00 PM - 6:15 PM

[20p-438-17] Nitriding treatment by Active Screen Plasma and its evaluation ２

〇(PC)Susumu Ichimura¹, Seigo Takashima¹, Ippei Tsuru², Daichi Ohkubo², Hideaki Matsuo², Mineo Goto² (1.Nagoya Industries Promotion Corporation, 2.NAKANIHON-RO KOGYO CO., LTD.)

Fri. Sep 21, 2018 9:00 AM - 12:15 PM 136 (3Ｆ_Lobby)

Oral presentation
| 8 Plasma Electronics
| 8.5 Plasma phenomena, emerging area of plasmas and their new applications

[21a-136-1~12] 8.5 Plasma phenomena, emerging area of plasmas and their new applications

9:30 AM - 9:45 AM

[21a-136-3] Gas decomposition using atmospheric pressure plasma and its evaluation

〇(PC)Susumu Ichimura¹, Seigo Takashima¹, Yoshihisa Yamaguchi², Takayuki Yamada² (1.Nagoya Industries Promotion Corporation, 2.YAMADA-KASEI Limited Company)

▲