Naoya Okada

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Speaker, Author, Co-Author

Tue. Mar 20, 2018 9:15 AM - 12:15 PM C101 (52-101)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[20a-C101-1~11] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

9:45 AM - 10:00 AM

[20a-C101-3] Cu diffusion barrier properties of Cluster-preforming-deposited WSi_n (n = 12) insertion film

〇Naoya Okada¹, Noriyuki Uchida¹, Shinichi Ogawa¹, Toshihiko Kanayama¹ (1.AIST)

Mon. Mar 19, 2018 9:30 AM - 11:30 AM P6 (P)

Poster presentation
| 17 Nanocarbon Technology
| 17 Nanocarbon Technology（Poster）

[19a-P6-1~79] 17 Nanocarbon Technology（Poster）

9:30 AM - 11:30 AM

[19a-P6-67] Chemical vapor deposition of WS₂ by using H₂S and WF₆ gas sources

〇Naoya Okada¹, W. H. Chang¹, Kenji Koga¹, Toshifumi Irisawa¹ (1.AIST)