9:15 AM - 9:30 AM
〇Atsushi Hieno1, Tsutomu Nakanishi1, Yusuke Tanaka1 (1.Toshiba Memory Corp.)
Oral presentation
13 Semiconductors » 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology
Tue. Mar 20, 2018 9:15 AM - 12:15 PM C101 (52-101)
Masato Sone(Titech)
△:奨励賞エントリー
▲:英語発表
▼:奨励賞エントリーかつ英語発表
空欄:どちらもなし
9:15 AM - 9:30 AM
〇Atsushi Hieno1, Tsutomu Nakanishi1, Yusuke Tanaka1 (1.Toshiba Memory Corp.)
9:30 AM - 9:45 AM
〇Keita Ichikawa1, Yudai Fukuyama2, Shingo Maeda1, Yoko Yamanishi2 (1.Sibaura Inst., 2.Kyushu Univ.)
9:45 AM - 10:00 AM
〇Naoya Okada1, Noriyuki Uchida1, Shinichi Ogawa1, Toshihiko Kanayama1 (1.AIST)
10:00 AM - 10:15 AM
〇(B)Kosuke Oshinari1, Masaki Kondo1, Mamiko Yagi1, Masahiko Hasumi1, Wakana Kubo1, Junichi Shirakashi1, Toshiyuki Sameshima1, Mohamed Amara2 (1.TUAT, 2.INSA)
10:15 AM - 10:30 AM
〇Jihee Jeon1, Akihiro Suzuki1,2, Kouta Takahashi1,2, Osamu Nakatsuka1,3, Shigeaki Zaima3 (1.Grad. Sch. of Eng., Nagoya Univ., 2.Research Fellow of JSPS, 3.IMaSS, Nagoya Univ.)
10:30 AM - 10:45 AM
〇Toshiki Nishimoto1, Takashi Nakayama1 (1.Chiba Univ.)
11:00 AM - 11:15 AM
〇Yongxun Liu1, Kazushige Sato2, Hiroyuki Tanaka1,2, Kazuhiro Koga2, Sommawan Khumpuang1,2, Masayoshi Nagao1, Takashi Matsukawa1, Shiro Hara1,2 (1.AIST, 2.MINIMAL)
11:15 AM - 11:30 AM
〇Kazuhiro Koga1, Y. X. Liu2, Fumito Imura1,2, Masashi Kase2, Shuichi Noda1,2, Kazumasa Nemoto2, Somawan Khumpuang1,2, Shiro Hara1,2 (1.Minimal, 2.AIST)
11:30 AM - 11:45 AM
〇Kazuhiro Koga1, Y. X. Liu2, Fumito Imura1,2, Masashi Kase2, Shuichi Noda1,2, Kazumasa Nemoto2, Somawan Khumpuang1,2, Shiro Hara1,2 (1.Minimal, 2.AIST)
11:45 AM - 12:00 PM
〇Tomoaki Kageyama1,3, Kazuhiro Koga2, Sommawan Khumpuang3,2, Shiro Hara3,2, Sang-Seok Lee1 (1.Tottori Univ., 2.MINIMAL, 3.AIST)
12:00 PM - 12:15 PM
Masaya Negawa1, Hiroki Kamehama1, 〇Satoshi Fujii1,2, Haruki Toonoe3 (1.NIT, Okinawa Coll., 2.Tokyo Tech, 3.Yokogawa S. S. Corp.)
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