Shuichi Noda

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Speaker, Author, Co-Author

Mon. Mar 19, 2018 1:45 PM - 6:15 PM C204 (52-204)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[19p-C204-1~17] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

1:45 PM - 2:00 PM

[19p-C204-1] Investigation of Ge Etching Mechanism by Neutral Beam Etching

〇Shuichi Noda^1,2, Yosuke Tanimoto³, Takuya Ozaki², Hideyuki Kurihara³, Yasuyuki Hoshino³, Kazuhiko Endo^1,2, Seiji Samukawa^1,2 (1.AIST, 2.Tohoku Univ., 3.SHOWA DENKO)

Tue. Mar 20, 2018 1:45 PM - 4:45 PM C101 (52-101)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[20p-C101-1~11] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

2:30 PM - 2:45 PM

[20p-C101-4] Formation of TiN Films Using Minimal Sputtering Tool

〇Shuichi Noda¹, Hiroyuki Tanaka^1,2, Kazumasa Nemoto¹, Kazuhiro Koga², Yuki Yabuta³, Naoko Yamamoto³, Ryuichiro Kamei³, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.MINIMAL, 3.Seinan-Kogho)

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