Masashi Kase

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Speaker, Author, Co-Author

Tue. Mar 20, 2018 1:45 PM - 4:45 PM C101 (52-101)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[20p-C101-1~11] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

3:30 PM - 3:45 PM

[20p-C101-7] Development and Characterizaion Minimal Plasma tool for Metal Etching

〇Masashi Kase¹, Hiroyuki Tanaka^1,2, Yoshiyuki Nozawa³, Toshiyasu Hayami³, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.MINIMAL, 3.SPP Technologies)

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