[18p-C309-1~13] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

△ [18p-C309-5] Pressure dependence of polycrystalline diamond film deposition using
time-series exposure of modulated and non-modulated Ar/CH₄/H₂ induction thermal plasmas.

〇(M1)Kazufumi Hata¹, Kano Naoki¹, Nakano Yusuke¹, Tanaka Yasunori¹, Uesugi Yoshihiko¹, Ishijima Tatsuo¹ (1.Kanazawa Univ.)

Keywords:Modulated induction thermal plasma, Non-modulated induction thermal plasma, Polycrystalline diamond

We investigated pressure dependence of polycrystalline diamond film deposition by exposure of modulated and non-modulated induction thermal plasmas. The modulated induction thermal plasma was used for nucleation of diamond particles and the non-modulated induction thermal plasma was adopted for particle growth. Results showed that reducing pressure increased deposition rate of diamond film. This may be because higher hydrocarbon-based particle flux is exposed at lower pressures.