Oral presentation

13 Semiconductors » 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[10a-M114-1~11] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

Sun. Mar 10, 2019 9:00 AM - 12:00 PM M114 (H114)

Takashi Noguchi(Univ. of the Ryukyus), Seiichiro Higashi(Hiroshima Univ.)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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9:00 AM - 9:15 AM

△ [10a-M114-1] TFT operation of solid-phase crystallized Ge thin film with high hole mobility

〇Toshifumi Imajo¹, Kenta Moto¹, Keisuke Yamamoto², Takashi Suemasu¹, Hiroshi Nakashima³, Kaoru Toko¹ (1.Univ. of Tsukuba, 2.IGSES, Kyushu Univ., 3.GIC, Kyushu Univ.)

9:15 AM - 9:30 AM

[10a-M114-2] Sb-doped solid-phase crystallization for high-quality n-type polycrystalline Ge films

〇Masaya Saito¹, Daichi Takahara¹, Toshifumi Imajo¹, Kenta Moto¹, Takashi Suemasu¹, Kaoru Toko¹ (1.Univ. of Tsukuba)

9:30 AM - 9:45 AM

△ [10a-M114-3] Double-gate Cu-MIC poly-Ge thin-film transistors on PI formed by spin coating

〇(M2)Hiroki Utsumi¹, Akito Hara¹ (1.Tohoku Gakuin Univ.)

9:45 AM - 10:00 AM

[10a-M114-4] High activation of Poly-Si using short dwell Flash Lamp Annealing

〇Shogo Shigemasu¹, Hideaki Tanimura¹, Kazuhiko Fuse¹, Takayuki Aoyama¹, Shinichi Kato¹, Yoshihide Nozaki¹ (1.SCREEN Semiconductor Solutions)

10:00 AM - 10:15 AM

△ [10a-M114-5] Prominent Ridge Control of LTPS Thin Films by Laser Annealing

〇(B)Fuminobu Hamano¹, Kaname Imokawa^1,2, Daisuke Nakamure¹, Hiroshi Ikenoue^1,2 (1.Kyushu Univ., 2.Dept. of Gigaphoton Next GLP, Kyushu Univ.)

10:15 AM - 10:30 AM

[10a-M114-6] Crystallization of a-Si Film on Panel using Lumped-shots ELA

〇Takashi Noguchi¹, Ryusuke Nakatsura¹, Yuya Ishiki¹, Tatsuya Okada¹, Karim Huet² (1.Univ. of the Ryukyus, 2.SCREEN Semiconductor Solutions Co., Ltd.)

10:45 AM - 11:00 AM

△ [10a-M114-7] Grain-Shape Control of LTPS Thin Films by Selective Laser Annealing

〇(B)Takahiro Yamada¹, Kaname Imokawa^1,2, Daisuke Nakamura¹, Tetsuya Goto³, Hiroshi Ikenoue^1,2 (1.Kyushu Univ., 2.Dept. of Gigaphoton Next GLP, Kyushu Univ., 3.Tohoku Univ.)

11:00 AM - 11:15 AM

[10a-M114-8] Schmid Factor of the Deformation Twinning in the CW Laser Crystallized Si Film

〇Nobuo Sasaki^1,2, Muhammad Arif², Yukiharu Uraoka² (1.Sasaki Consulting, 2.NAIST)

11:15 AM - 11:30 AM

[10a-M114-9] Temperature Distribution Analysis in Molten Silicon during Atmospheric Pressure Thermal Plasma Jet Irradiation

〇Yuri Mizukawa¹, Hanafusa Hiroaki¹, Seiichiro Higashi¹ (1.Hiroshima Univ.)

11:30 AM - 11:45 AM

[10a-M114-10] Preparation of Single Crystalline Stripes by mCLBS using Sputtered Si Films

〇Tatsuki Koyanagi¹, Toshiki Shirakawa¹, Mitsuki Hirasue¹, Wenchang Yeh¹ (1.Shimane Univ.,Interdisciplinary Fac. Sci. & Engng.)

11:45 AM - 12:00 PM

[10a-M114-11] Fabrication of n-type TFT using μ CLBA induced Si stripe

〇Mitsuki Hirasue¹, Wenchang Yeh¹ (1.Shimane Univ.)

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