Investigation of degradation mechanism and influence of post processes around NiO/ZnO heterointerface

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

Sun. Mar 10, 2019 9:00 AM - 11:45 AM W641 (W641)

9:15 AM - 9:30 AM

〇Naruhide Kato¹, Kohei Takeuchi¹, Wang Zehua¹, Ryo Tanuma¹, Mutsumi Sugiyama^1,2 (1.Tokyo Univ. of Sci., 2.RIST)

Keywords:Nickel oxide, interface, wide bandgap