The 66th JSAP Spring Meeting, 2019

Presentation information

Oral presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[11p-W641-1~14] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Mon. Mar 11, 2019 1:45 PM - 5:30 PM W641 (W641)

Daisuke Ogawa(Chubu Univ.), Kazunori Shinoda(HITACHI)

3:45 PM - 4:00 PM

[11p-W641-8] Transition Metal (Ni, Co) Thermal Etching by Hexafluoroacetylacetone (hfac)

Tomoko Ito1, Karahashi Kazuhiro1, Satoshi Hamaguchi1 (1.Osaka Univ.)

Keywords:Transition Metal, Atomic layer etching