[12a-W641-1~14] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[12a-W641-13] Formation of IGZO Thin Film Transistor at Large Area Substrate with Plasma Enhanced Reactive process

Yuichi Setsuhara¹, 〇Kosuke Takenaka¹, Tomoki Yoshitani¹, Hiroyuki Hirayama¹, Masashi Endo¹, Giichiro Uchida¹, Akinori Ebe² (1.Osaka Univ., 2.EMD Corp.)

Keywords:IGZO, Sputtering