Hitoshi Habuka

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Speaker, Author, Co-Author

Fri. Mar 19, 2021 9:00 AM - 11:45 AM Z24 (Z24)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[19a-Z24-1~10] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

11:00 AM - 11:15 AM

[19a-Z24-8] Boron Doping Method using BCl3 gas for Silicon Minimal CVD Film Formation

Atsuhiro Motomiya¹, Mana Otani¹, 〇Hitoshi Habuka¹, Shin-ichi Ikeda^2,3, Yuuki Ishida^2,3, Shiro Hara^2,3 (1.Yokohama National Univ., 2.MINIMAL, 3.AIST)

Wed. Mar 17, 2021 9:00 AM - 11:45 AM Z28 (Z28)

Oral presentation
| 15 Crystal Engineering
| 15.6 Group IV Compound Semiconductors (SiC)

[17a-Z28-1~10] 15.6 Group IV Compound Semiconductors (SiC)

11:00 AM - 11:15 AM

[17a-Z28-8] SiC Epitaxial reactor cleaning by detaching SiC film

Takumi Mamyouda¹, Masaya Hayashi¹, 〇Hitoshi Habuka¹, Akio Ishiguro², Shigeaki Ishii², Yoshiaki Daigo², Hideki Ito², Ichiro Mizushima², Yoshinao Takahashi³ (1.Yokohama National Univ., 2.NuFlare Technology, 3.KANTO DENKA KOGYO)

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