[19p-Z24-1~10] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[19p-Z24-7] Minimal Fab metal film thickness tester by total X-ray reflection fluorescence

〇Kana Onishi¹, Hiroshi Nishizato¹, Tatsuya Hayashi¹, Wataru Sakai¹, Jun Hirose¹, Shuichi Noda², Hiroshige Kogayu³, Sommawan Khumpuang^2,3, Shiro Hara^2,3 (1.HORIBA STEC Co., Ltd., 2.AIST, 3.MINIMAL)

Keywords:MINIMAL, TXRF