The 83rd JSAP Autumn Meeting 2022

Presentation information

Oral presentation

13 Semiconductors » 13.6 Nanostructures, quantum phenomena, and nano quantum devices

[20p-C401-1~16] 13.6 Nanostructures, quantum phenomena, and nano quantum devices

Tue. Sep 20, 2022 1:30 PM - 6:00 PM C401 (C401)

Toshihiro Nakaoka(Sophia Univ.), Ryuichi Ohta(NTT), Takayuki Hasegawa(Osaka Inst. of Tech.)

5:15 PM - 5:30 PM

[20p-C401-14] SiGe Quantum-Dot Formation in Si-Oxide Film using Double Si+/Ge+ Hot Ion Implantation

Koki Murakawa1, Takashi Aoki1, Toshiyuki Samejima2, Tomohisa Mizuno1 (1.Kanagawa Univ., 2.Tokyo Univ. Agri. Tech.)

Keywords:quantum-dot, SiGe, hot ion implantation

低エネルギーでのPL発光を目指し,酸化膜中へのダブルSi+/Ge+ホットイオン注入法によるSiGe量子ドットの形成と,PL発光特性について検討し,Si酸化膜中にSiGe-QDの形成と近赤外域PL発光を実現できた.