[22p-A406-1~15] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

△ [22p-A406-13] Deposition of rutile titanium oxide thin film using high power pulsed magnetron sputtering

〇(M1C)Miyuki Nishimura¹, Takayuki Ohta¹ (1.Meijo Univ.)

Keywords:high power pulsed magnetron sputtering, rutile titanium oxide, crystal structure

The rutile TiO₂ films were deposited using HPPMS in Ar and O₂ gases without substrate heating. From XRD measurement, it is confirmed that the transformation from anatase phase to rutile phase occurred with increasing the target voltage. The ionization of the species was proceeded in the plasma evaluated by optical emission spectroscopy. Ion bombardment
a. Therefore, it is indicated that increase of ions is effective for coating rutile TiO₂