Influence of pulse operation on ionic composition in a dual-frequency capacitively-coupled Ar/C4F8/O2 plasma

Presentation information

Oral presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Thu. Sep 22, 2022 1:00 PM - 5:00 PM A406 (A406)

Toru Harigai(Toyohashi Univ. of Tech.), Takayoshi Tsutsumi(名大)

2:30 PM - 2:45 PM

〇Yuto Seki¹, Haruhito Kato¹, Shuichi Kuboi¹, Haruka Suzuki^1,2, Hirotaka Toyoda^1,2,3 (1.Nagoya Univ., 2.cLPS, Nagoya Univ., 3.NIFS)

Keywords:Dual-Frequency capacitively-coupled plasma, Fluorocarbon, Pulsed plasma