The 83rd JSAP Autumn Meeting 2022

Presentation information

Oral presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[23a-B101-1~10] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Fri. Sep 23, 2022 9:00 AM - 11:45 AM B101 (B101)

Kosuke Takenaka(Osaka Univ.), Giichiro Uchida(Meijo Univ)

11:00 AM - 11:15 AM

[23a-B101-8] Effect of post-treatment with atmospheric pressure plasma on metal oxide thin films deposited by mist CVD

〇(M2)Hiroya Kobayashi1, Takeda Keigo1, Hiramatsu Mineo1 (1.Meijo Univ.)

Keywords:surface treatment, atmospheric pressure plasma, mist CVD