[23a-B101-1~10] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

△ [23a-B101-7] Effects of Atmospheric Pressure Low Temperature O₂ Plasma-Assisted Annealing
on Pt-Doped Rutile Phase TiO₂ Nanoparticles

〇(M1)Yuta Makino¹, Retsuo Kawakami¹, Shin-ichiro Yanagiya^1,2, Masahito Niibe³, Yoshitaka Nakano⁴, Takashi Mukai⁵ (1.Tokushima Univ., 2.pLED, Tokushima Univ., 3.Hyogo Univ., 4.Chubu Univ., 5.Nichia Corp.)

Keywords:platinum-doped titanium dioxide, plasma-assisted annealing, white LED

Pt-doped rutile TiO₂ nanoparticles were annealed with the assistance of atmospheric-pressure low-temperature O₂ plasma. The plasma-assisted annealing greatly enhanced the visible-light-induced photocatalytic activity as compared to the thermal annealing in ambient air. This result indicates that the plasma-assisted annealing is an effective technology in improving the photocatalytic activity of Pt-doped rutile TiO₂ nanoparticles under visible light irradiation.