Oral presentation
8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment
Fri. Mar 17, 2023 9:00 AM - 11:30 AM A205 (Building No. 6)
Akihisa Ogino(Shizuoka Univ.)
△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above
9:00 AM - 9:15 AM
〇(B)Tatsuki Takenaka1, Yoshifumi Aoi1, Masateru Nose2 (1.Ryukoku Univ., 2.Toyama Univ.)
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9:15 AM - 9:30 AM
〇(B)Yuki Oba1, Kimihide Ito1, Masateru Nose2, Yoshifumi Aoi1 (1.Ryukoku Univ., 2.Toyama Univ.)
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9:30 AM - 9:45 AM
〇Kosuke Takenaka1, Hibiki Komatsu1, Tomoki Fujimura1, Susumu Toko1, Keisuke Ide2, Akinori Ebe3, Toshio Kamiya2, Yuichi Setsuhara1 (1.Osaka Univ., 2.MSL Tokyo Tech., 3.EMD Corp.)
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9:45 AM - 10:00 AM
〇Daisuke Ohori1, Takuya Ozaki1, Yiming Li2, Kazuhiko Endo1, Seiji Samukawa2,1 (1.IFS, Tohoku Univ., 2.NYCU)
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10:00 AM - 10:15 AM
〇Kouta Ishigure1, Mineo Hiramatsu1, Takeda Keigo1 (1.Meijo university)
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10:30 AM - 10:45 AM
〇Mizuki Ueno1, Kazuki Ishizaki1, Hiroaki Kakiuchi1, Hiromasa Ohmi1 (1.Osaka Univ.)
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10:45 AM - 11:00 AM
〇(M1)Yusuke Ando1, Hiroki Kondo2, Kenji Ishikawa2, Takayoshi Tsutsumi2, Makoto Sekine2, Masaru Hori2 (1.Nagoya Univ. Eng., 2.Nagoya Univ. cLPS)
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11:00 AM - 11:15 AM
〇Takashi Hamano1,5, Takayuki Matsuda1, Yuya Asamoto1,5, Masao Noma2, Shigehiko Hasegawa3, Michiru Yamashita4, Keiichiro Urabe1, Koji Eriguchi1 (1.Kyoto Univ., 2.Shinko Seiki. Co., LTD., 3.Osaka Univ., 4.Hyogo Pref. Inst. Technol., 5.JSPS Research Fellow)
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11:15 AM - 11:30 AM
〇jumpei kito1, Yoshinori Saiki1, Kento Homma1, Seiya Watanabe1, Takahiro Bando1, Toru Harigai1, Hirofumi Takikawa1, Hiroki Gima2, Hiroaki Sugita2 (1.Toyohashi Univ. Technol., 2.OSG)
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